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ID:57609815
大小:3.32 MB
页数:42页
时间:2020-08-28
《OLED面板制造流程(全英文).ppt》由会员上传分享,免费在线阅读,更多相关内容在教育资源-天天文库。
1、OLEDProcessITOsputteringITOpatterningCleaningPre-treatmentITOtestSynthesisPurificationMaterialtestDepositionPackageDevicetestPixelationBasicProcessITOGlassPRcoatingApplyInsulationlayer+PRcoatingInsulationlayerDevelopingDeveloping+EtchingManufacturingProcessITOGlassIns
2、ulationlayerPhotosensitivematerialcoatingOverhangRampartDevelopingManufacturingProcessITOGlassInsulationlayerRampartOverhangManufacturingProcessITOGlassInsulationlayerRampartOverhangEmittinglayersManufacturingProcessITOGlassInsulationlayerRampartOverhangEmittinglayers
3、CathodeSideviewEncapsulationManufacturingProcessSubstratesPreparation-ITOpatterningSpincoatingExposurePre-bakeSoft-bakeDevelopEtchingPhotoMaskPhotoresisterITOGlassUVlightManufacturingProcessOrganiclayersInsulatorITOGlassCathodeShort(leakagecurrent)SubstratesPreparatio
4、n-PixelationManufacturingProcessRibITOGlassCathodeSubstratesPreparation-Cathodeseparator(Rib)ManufacturingProcessManufacturingProcessSubstratesPreparation-Pre-treatmentManufacturingProcessDeposition-ThermoevaporationManufacturingProcessDeposition–OVPD(OrganicvaporPhas
5、eDeposition)ManufacturingProcessManufacturingProcessManufacturingProcessDeposition–LinerSourceManufacturingProcessDeposition–VerticalIn-LineMachineManufacturingProcessManufacturingProcessDeposition–Ink-JetPrinterManufacturingProcessDeposition–Maskforside-by-sideManufa
6、cturingProcessDeposition–CathodeManufacturingProcessDeposition–TransparentCathodeITOsputteringCleaningPre-treatmentMaterialDepositionEncapsulationDevicetestBasicProcessPretreatmentOrganicchamberw/oalignerElectrodechamberSputteringchamberL/ULchamberOrganicchamberw/alig
7、nerEncapsulationTFTsubstrateAnode(ITO)HI-406HT-320RD-001/AlQ3AlQ3Cathode(Al)AlQ3:LiTFTsubstrateAnode(ITO)HI-406HT-320C545T/AlQ3AlQ3Cathode(Al)AlQ3:LiTFTsubstrateAnode(ITO)HI-406HT-320BD-52/BH-140AlQ3Cathode(Al)AlQ3:LiThelayerstructuresofR,G,BOLEDBlueGreenRedTopinsulat
8、orITOGlassCathodeManufacturingProcessAlignmentmarkforsubstrateandoffsetmethod.190mm±0.055mm±0.055mm±0.05Φ80μmShape:●or■or+CC
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