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ID:57057579
大小:3.08 MB
页数:31页
时间:2020-07-30
《HIPIMS,HIPIMS+ 大功率脉冲磁控溅射课件.ppt》由会员上传分享,免费在线阅读,更多相关内容在教育资源-天天文库。
1、1OverviewPresentationHipims+byHauzerWhyHighPowersputtertechnologyHipimsvs.Hipims+Coatings:TiAlN,Cr2NMachineintegrationinFlexicoat®2Plasmatechnologywithhigh%ofthematerialtobedepositedisionized.Gainingcontroloverstress->Controlmicrostructure/textureTocreatedefectfreecoatingswithgoodadhesion.Tomak
2、ecoatingsfortoolandtriboapplicationswhichoutperformarcdepositedcoatingsToreducethermalloadofsubstrateToincreasedepositionrateofsputteringprocessWhyHighpowerpulsesputtering?3CapacitordischargePeakpulsepowersfromkWtoMWLowfrequency(dutycycle)PulseenergyandvoltagecanbedefinedPulseshapeisdeterminedb
3、ysystemconfigurationCablingPressureSputteringatmosphereMagnetrondesignConceptbehindHIPIMSTechnology4HIPIMSPlasmacompositioninArN2SumofAr++Ar+++Ti++Ti+++N++N++=100%RatioofN+toN2+issignificantlyhigherinaHIPIMSdischargethanin(pulsed)DCdischarge.MorereactiveNspecies.5HIPIMSTiAlNExperimentExperiment
4、overviewSample:polishedM2HSSTarget:50/50at%AlTiDep.Temp.:450-520oCFilmthickness:2-3µmFullloadinchamber,ThreefoldrotationSample#EtchingDepositionsourceconfigurationBiasvoltage1SpuHIPIMSTi2DC+1HIPIMS-75V2SpuHIPIMSTi2DC+1HIPIMS-95V3SpuHIPIMSAlTi1DC+2HIPIMS-75V1ArcArcTi2x4CARC-40V2ArcArcTi2x4CARC-7
5、0V62D1H95HIPIMS-95Vbias2D1H75HIPIMS-75VbiasA70Arc-70VbiasResults-RoughnessAFM30x30µmSignificantimprovementinsurfaceroughness7Results-RoughnessRoughnessdata8Ionenergy2D1H75VHIPIMS-75V2D1H95HIPIMS-95VResults-MorphologyAFM2x2µmIncreaseinionenergy(higherbias)withconstantionfluxleadstodensific
6、ationofcoatingColumnscoalescetoreducenumberofboundariesResputteringoffilmevidentatgrowingsurface9Results–HardnessandEmodulusHardnessincreaseswithincreasingbiasoradditionofHIPIMSCathodes.NodefinitetrendforEmodulus–possibledifferencesduetochangesinMicrostructure.10Results–ScratchtestAlTietchedTie
7、tchedCriticalloadsforHIPIMSetchedsamplesclosetothoseforarcetchedSamples.NoapparentdifferenceInadhesionwithrespecttoetchingmaterial.11ConclusionsHIPIMSTiAlNItispossibletocreateAlTiNcoatingsbyHIPIMSdepositionwithmaterialpropertiessi
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