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1、BUSELECTRODE&BlackStripeMATERIALS&PROCESSSichunCOCdisplaydeviceCo.,LtdDep.Technical&QualityINDEX01ElectrodeforPDP02ElectrodeProcess03ElectrodeMaterials04ManufacturingConditionPDPBasicStructureFrontGlassSubstrateBuswhiteElectrodeBusblackElectrodeDielectricLayerProtectiveLayer(MgO)Transp
2、arent(ITO)ElectrodeBlackStripeRibAddressProtectiveLayerAddressElectrodeRedPhosphorGreenPhosphorRearGlassSubstrateBluePhosphorBUS&BS作用Buselectrode目的:补偿透明电极的高电阻要求特性:低电阻,与透明电极的Matching性,宽幅均一性,跟介质的Matching性,glass附着性BlackStripe目的:불필요한방전영역을광학적으로차폐하고,提升contrast要求特性:低透光率和低反射率<各种Bus&BS构造>外来光Ele
3、ctrodeProcessBusAgElectrodeFormationProcessElectrodeblackpasteElectrodewhitepasteUVExposurePrinting/DryingPrint/DryingUVExposureBurnoutInspection/Developing/SinteringElectrodeProcessAddressAgElectrodeFormationProcessElectrodepasteUVExposurePrinting/Drying/DevelopingBurnoutInspection/Si
4、nteringBUS&BSMaterials■BusAgelectrode(buswhite)Ag,GlassfritAcrylicbinder,Acrylicmonomer,multifunctionalmonomer,initiator,■BlackStripeBlackpigment,GlassfritAcrylicbinder,Acrylicmonomer,multifunctionalmonomer,initiator,BUS&BSMaterials1.烧结时,Buswhite电极一部分Ag与ITO相遇BusWhiteBusBlackITOFiringBu
5、sblack及white电极的glassfrit热特性2.在Busblack中添加可导电的物质(例如RuO)ElectrodeMaterialUVExposure(MechanismofPhoto-Crosslinking)Ⅰ.PhotoinitiationUVR-R2R*R*+CH2=CH-COORRCH2—CH-COOR*Ⅱ.PropagationRCH2—CH-COOR+CH2=CH-COORRCH2—CH-COOR*CH2—CH-COOR*RCH2—CH-COOR+CH2=CH-COORRCH2—CH-COORPolymerCH2—CH-COORC
6、H2—CH-COOR*CH2—CH-COOR*Ⅲ.InhibitionR*+RCH2—CH-COORRCH2—CHR-COOR*ElectrodeMaterialMechanismofDevelopment1)Neutralizesurface-COOHgroupR-COOH+Na2CO3R-COONa++H2O+NaHCO32)Hydrateionicmaterials,swellingwithH2O3)Dissolveorphysicallyremoveswollenmaterial(organicbinderdissolved/removed→discre
7、teinorganicparticlespray-out)UVAqueousNa2CO3COO-Na+COO-Na+PhotosensitiveAgpasteExposureAreaUVExposureDevelopmentExposedareasresistswellingandremovalofmaterialbecauseofencapsulationbythecrosslinkedpolymernetworkProcessmargin)㎛Dev.Linewidth(Drytemperature(℃))㎛Dev.Linewidth(Exposure(mj/