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ID:49615156
大小:1.53 MB
页数:15页
时间:2020-03-02
《MEMS复习攻略.doc》由会员上传分享,免费在线阅读,更多相关内容在行业资料-天天文库。
1、特此感谢:卓著、王明斗、兰天翔、唐小涛、周孝吉对本攻略的贡献。董建鹏2015/1/14简述:1、只是包含MEMS中需要自己总结的内容比较多的知识(除ppt6-7一些琐碎的概念,其他章节部分需要总结的基本已涵盖)。2、时间仓促,做得可能不是很完善请谅解。3、英语水平有限,单词语法错误自己改正4、若有错误或没有涉及到的还望大家补充改正(英语)。5、.祝各位取得好成绩!!!!!151.difference:MEMSisaprocesstechnologyusedtocreatetinyintegrateddevicesors
2、ystemsthatcombinemechanicalandelectricalcomponents.NEMSisagreatdevelopmentofMEMS.Content:(1)Scalesize(2)Material(3)ProcesstechnologyMEMSNEMSBasicmaterialSiliconCarbonMEMSNEMSScaleSize1.Component:1um~100um2.Device:0.1mm~1mm1nm~100nm(4)Principle(5)Feature(6)Applic
3、ation(自己酌情删减)MEMSNEMSProcesstechnology1.Miniaturizedmachinetool2.Wetetching3.Dryetching(RIEANDDRIE)4.Electrodischargemachining(EDM):5.LIGA(X-ray)1.AFM/STMinducedoxidationmethod2.Electron-beamlithography(>20nm)3.Atomormoleculeassemblytechnique15MEMSNEMSprinciple1
4、.Highpowerdensity(Micro-scaleeffect)2.Largesurfaceareatovolumeratiomakessurfaceeffectsdominantovervolumeeffect.3.Largethermalconductivity1.Nano-scaleeffect2.Quantumeffect3.InterfacialeffectMEMSNEMSfeature1.Twodimensionorquasi-ThreedimensionStructure2.Highprecisi
5、on2-Dcontrol3.Integrationmassproduction4.lowpowerandless1.Ultra-smalldimension2.Ultra-highfrequencyResponse(morethan100MHZ)3.Ultro-lowpower15inertiaMEMSNEMSApplication1.Targeteddrugdeliverysystem2.Miniaturerobotsystem1.Biologicalmotor2.Ultra-highfrequencyRFreson
6、ator1.扰动执行器的组成及其运动过程:ScratchDriveActuator(SDA)(1)component:platebushinginsulator(绝缘体)substrate(2)processa)AppliedvoltagebendsSDAdownwardb)Whenreleased,SDAreturnstooriginalshape15b)ReapplyingvoltagecausesSDAtomoveadistance’dx’1.Patterntransfer(1)thinfilmonsubstra
7、teSilicondioxideisdepositedasstructuralorsacrificialonthesubstratebyPVDorCVD.(2)photoresistcoatedResisttypically1um.Spinresistalwaysbeusedtoachieveauniformthinsurface.(3)patternphotoresistWaferistransferredtoanexposuresystemwhereitisplacedbetweenaphotomaskandexp
8、osedwithanultravioletradiation.(4)resistdevelopmentThephotoresistcoatedwaferundergoesdevelopmentstagewhere15selectivedissolvingofphotoresisttakesplace.(5)etchofthethi
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