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ID:48752941
大小:3.07 MB
页数:41页
时间:2020-01-21
《电子束暴光介绍.ppt》由会员上传分享,免费在线阅读,更多相关内容在行业资料-天天文库。
1、ElectronBeamLithographyBastienRipocheLaurentRobinJavariaAhmadEnricHerreroAbellanasPatterningtechniquesTheelectronbeamlithographyApplicationsoftheEBLFutureoportunitiesforEBLCriteriumsaboutdifferenttechniquesResolutionSpeedEasyfabricationCostPatterningTechniquesPatterningTech
2、niquesOpticalLithographya)DeepUltarvioletLithographyb)ExtremeUltravioletLithographyc)XRaysNanoimprint1)OpticalLithographyPhotoresistiveresinePatterns:MasksWavelenghtresolutiondependantResolutionLimitsContactAdvantages:GoodresolutionDrawbacks:MasksthinandflexibleUse->defe
3、ctsResolutionLimitsProximityAdvantages:MaskslifetimehighDrawbacks:ResolutionnotasgoodDiffractionFresneldiffractionGap~20-50μmResolutionLimitsProjectionAdvantages:GoodresolutionNodeteriorationImagesmallerthanmaskDrawbacks:FraunhofferdiffractionCompromisebetweenresolutionand
4、depthoffocusb)ExtremeUltravioletLithographySmallwavelenghtBetterresolutionNolences:mirrorsLaserplasmasources10nmc)XRay<1nmforMedicalpurposesProblemsofmasksLences,mirrorsDifficulttoproduce2)Nanoimprint2techniques:HeatresineCooldownUVradiationsEUVsooninfabricationNanoimpri
5、ntEbeamfor22nmXRaysdifficultPatterningTechniquesTheelectronbeamlithographyTypesofEBLElectronBeamDirectWriteElectronProjectionLithographyBragg-Fresnellensforx-raysPaulScherrerInstituteElectronBeamDirectWriteAnelectrongunorelectronsourcethatsuppliestheelectrons.Anelectronc
6、olumnthat'shapes'andfocusestheelectronbeam.Amechanicalstagethatpositionsthewaferundertheelectronbeam.Awaferhandlingsystemthatautomaticallyfeedswaferstothesystemandunloadsthemafterprocessing.Acomputersystemthatcontrolstheequipment.ElectronBeamDirectWriteTypesofelectrongunsTh
7、ermoionicFieldemissionWrite-field(WF)ScanningmethodsRasterscanVectorscanRaith150Manual(NanostructurePhysicsDept.KTH)AndersLiljeborgSpecifications,arealexampleRaith150Beamsize≤ 2nm@20keVBeamenergy100eV-30keVMinimumlinewidth20nmImportfileformatGDSII,DXF,CIF,ASCII,BMPElectronP
8、rojectionLithographyElectronBeamDirectWriteSCALPEL(BellLaboratoriesandLucenttechno
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