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1、WAT测量项目以及测试方法TD/DTD/DD:SutterDai2008/03/07WATIntroductionWAT是什么WAT系统介绍3.WAT测试项目及方法WaferAcceptanceTest（晶片允收测试）半导体硅片在完成所有制程工艺后，针对硅片上的各种测试结构所进行的电性测试。通过对WAT数据的分析，我们可以发现半导体制程工艺中的问题，帮助制程工艺进行调整。WAT是什么?WAT系统介绍ManualProberAgilent4284ACVMeterAgilent4156AIVMeterCascadeManualPr
2、oberWAT系统介绍Agilent4070systemTELP8XLAgilent4070WAT系统介绍HP4070ServerAgilent81110APulseGeneratorAgilent4284ACVMeterAgilentE4411BSpectrumAnalyzerAgilent4070内部结构Agilent3458ADigitMultimeterWaferAuto-ProberRelayMetricServerEDAServerTestKeyProbecardSMUPINNoDataDataProductinf
3、ormationTestProgramControlcommandDCtesterCVMeter4070ServerWAT流程图WAT测试项目MOSdeviceFieldDeviceJunctionGateOxideResistorBipolarDeviceLayoutRuleCheck常见的几种器件结构MOSDeviceItemnameMethodofmeasurementIdsVd=Vg=Vdd,Vs=Vb=0,measureId,Ids=Id/WidthVt0Vd=0.1V,Vs=Vb=0,sweepVgfrom0Vto
4、3V,usemaximumslopemethod,Vt0=Xintercept–1/2*VdVt1Vd=0.1V,Vs=Vb=0,sweepVgfrom0Vto2V,measureId,Vt1=Vg@Id=0.1uA*Width/LengthIsubVd=Vdd,Vs=Vg=0,sweepVgfrom0toVddtogetmaximumIsubcurrentIoffVd=1.1Vdd,Vg=Vs=Vb=0,measureId,Ioff=Id/WidthBvdVg=Vs=Vb=0,sweepVdfrom0VtoVdstop(<3
5、Vdd),measureId,Bvd=Vd@Id=0.1uA/um以NMOS为例：2.FieldDeviceItemnameMethodofmeasurementVtVd=1.1Vdd,sweepVgfrom0VtoVgstop(<3Vdd),measureId,Vt=Vg@Id=10nA/umIleakVg=Vd=1.1Vdd,measureId,Ileak=Id/WidthVptVg=1.1Vdd,sweepVdfrom0VtoVdstop(<3Vdd),measureId,Vpt=Vd@Id=10nA/umWATItem
6、Name(以PolyNfield为例):VtNfpS(fieldVt)IleakNfpSVptNfpS(punchthroughVt)3.JunctionWATItemName(以N+/PWjunction为例):CNjIleakNjBvNjItemnameMethodofmeasurementCjVg=0V,Vb=GND,applya0.03VACsignaltomeasureCvalue,Cj=C/AreaIleakVg=1.1Vdd,measureIg,Ileak=Ig/AreaBvVb=0,sweepVgfrom0Vt
7、oVgstop(<3Vdd),measureIg,Bv=Vg@Ig=100pA/um24.GateOxideWATItemName(以PWgateoxide为例):CgpwToxpwBvCgpwItemnameMethodofmeasurementCoxVg=Vdd,Vb=GND,applya0.03VACsignaltomeasureCvalue,Cox=C/AreaToxVg=GND,Vb=Vdd,applya0.03VACsignaltomeasureCoxvalue,Tox=(εo*εox*Area)/CoxBvVb=
8、0,sweepVgfrom0VtoVgstop(<3Vdd),measureIg,Bv=Vg@Ig=100pA/um2NOTE:Iftherehasadummycapacitor,Cdummyshouldbesubtracted.(Cox=Cox-Cdummy)5.Resis
