ASTM铜合金标准

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1、APPLICATIONDATASHEETStandardDesignationForWROUGHTALLOYSLastUpdate:July19,2007CoppersC10100-C12099Composition,percentmaximum,unlessshownasarangeoraminimumPage1of2CopperNo.DesignationDescriptionCu(inclAg)Ag(%)MinAg(Troyoz)AsSbPTeOtherMinNamedElements(1)(3)C10100OFEOxygen-Free99.9

2、9min----.0005.0004.0003.0002.0005-ElectronicOxygen(2)(1)C10200OFOxygen-Free99.95min------------.0010Oxygen(4)C10300OFXLPOxygen-Free99.95min--------.001-.005----Copper(1)C10400OFSOxygen-Free99.95min.0278--------.0010withAgOxygen(1)C10500OFSOxygen-Free99.95min.03410--------.0010w

3、ithAgOxygen(1)C10700OFSOxygen-Free99.95min.08525--------.0010withAgOxygen(4)C10800OFLP--99.95min--------.005-.012----(1)C10910----99.95min------------.005OxygenC10920----99.90min------------.02OxygenC10930----99.90min.04413--------.02OxygenC10940----99.90min.08525--------.02Oxy

4、gen(1)C11000ETPElectrolytic99.90min------------(5)ToughPitch(1)C11010RHCRemelted99.90min------------(5)HighConducivity(1)C11020FRHCFire-Refined99.90min------------(5)HighConductivity(1)C11030CRTPChemically99.90min------------(5)RefinedToughPitch(1)C11040----99.90min----.0005.00

5、04--.0002(6)C11045ETPETP99.90min----.0005.0004--.0002(7)(1)C11100ETPElectronic99.90min------------(8)Composition,percentmaximum,unlessshownasarangeoraminimumPage2of2CopperNo.DesignationDescriptionCu(inclAg)Ag(%)MinAg(Troyoz)AsSbPTeOtherMinNamedElementsToughPitch,AnnealResistant

6、(1)C11300STPToughPitch99.90min.0278--------(5)withAg(1)C11400STPToughPitch99.90min.03410--------(5)withAg(1)C11500STPToughPitch99.90min.05416--------(5)withAg(1)C11600STPToughPitch99.90min.08525--------(5)withAg(9)C11700----99.9min--------.04--.004-.02BC12000DLPPhosphorus-99.90

7、min--------.004-.012----Deoxidized,LowResidualP(1):Thisisahighconductivitycopperwhichhas,intheannealedconditionaminimumconcuctivityof100%IACSexceptforAlloyC10100whichhasaminimumconductivityof101%IACS.(2):Thefollowingadditionalimpuritymaximumlimitsshallapply:Bi,1ppm(.0001%);Cd,1

8、ppm(.0001%);Fe,10ppm(.0010%);Pb,5ppm(.0005%);Mn,0.5ppm