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1、NanoStructuredMaterials,Vol.11,No.8,pp.1101±1109,1999ElsevierScienceLtdPergamonCopyright©2000ActaMetallurgicaInc.PrintedintheUSA.Allrightsreserved.0965-9773/99/$±seefrontmatterPIIS0965-9773(99)00400-6MANUFACTURINGANDSTRUCTUREINVESTIGATIONOFTiN-Al2O3-MULTILAYERSH.-D.Bauer*,B.Arnold,K.Bar
2、tsch,R.RennekampandA.LeonhardtInstitutfuÈrFestkoÈrper-undWerkstofforschungDresden,P.O.Box270016,D-01171Dresden,Germany(ReceivedJuly22,1999)(AcceptedOctober25,1999)AbstractÐWearresistantmultilayersconsistingofthecomponentsTiNandAl2O3aredepositedonWC-Co-hardmetalsubstratesbyplasmaassisted
3、chemicalvapourdeposition(PACVD)usingdifferentvariants.Crosssectionsofthelayeredsystemareinvestigatedbymeansofanalyticaltransmissionelectronmicroscopy(TEM).Correlationsbetweenthelayerformationandthenanostructureofthelayersarerevealed.Electronenergylossspectroscopy(EELS)inthescanningmodei
4、susedfortheinvestigationofnanoscaleinterfaceregions,wherebybothelement-andbondingspecificsignalsareusedforcharacterization.©2000ActaMetallurgicaInc.IntroductionThecoatingofcuttingtoolswithhardmateriallayerswiththeaimtorisetheirlifetimehasreachedahighlevel.BesidesPVD-andCVD-techniquesthe
5、plasma-assistedchemicalvapourdeposition(PACVD)hasadvancedintherecentyearsandenablestodaythedepositionofmetastablecompounds(asforinstance(Ti,Al)N(3,4,5,6),TiAlON(7)),thedepositionofheterogeneouslayers(9)aswellasofmultilayers(1,3,6,8).Additionallytoadvantageslikelowdepositiontemperaturesa
6、ndrelativelyhighdepositionratesthePACVD-techniquedistinguishesoneselfespeciallybythefactthatcrystallitesizesinthelayersintheorderofsomefewnmcanbereached.NormallyPACVD-multilayersystemswithindividuallayersinthemm-rangehavebetterwearpropertiesthanmonolayers(1,2,3,8).Becauseoftheattainable
7、lowcrystallitesizePACVD-multilayersystemswithindividuallayerthicknessmuchlessthan100nmshouldbeobtainable.Concerningthenanostructureandthemechanicalbehaviourofsuchlayerstheknowledgeisratherpoortillnow.However,investigationsofcompositelayersconsistingofnanocrystallineTiNandamorph
