氧化镓籽晶层的制备与其对外延生长氧化镓薄膜的影响

氧化镓籽晶层的制备与其对外延生长氧化镓薄膜的影响

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时间:2019-06-25

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1、氧化镓籽晶层的制备及其对外延生长氧化镓薄膜的影响PreparationofGa203seedlayeranditsinfluenceontheepitaxialgrowthofGa203filmsAbstractWiththerapiddevelopmentofoptoelectronicsemiconductortechnology,moreandmorepeoplegetinfavorofthebroadbandgapsemiconductormaterials.Galliumoxide(Ga203)isakindo

2、fbroadbandgapsemiconductormaterialofIII—VIgroups.Thep-Ga203isthemoststabletypeinthesefiveisomers.ThedirectbandgapofGa203iswide(4.2eV-4.9eV),andithasgoodchemicalstabilityandthermalstability,SOithasbroadapplicationprospects,suchasthedeepultraviolettransparentconduc

3、tivefilm,ultravioletdetectors,thinfilmelectroluminescentdevices,gassensor,andfieldeffecttransistor.Inthispaper,Ga203seedlayerwasfabricatedonsapphiresubstrates(A1203)byRFmagnetronsputteringtechnology,andthesapphiresubstratewiththeseedlayerwasannealedtreatment..The

4、nGa203filmswerefabricatedonsapphiresubstrateswithseedlayerandwithoutseedlayerbyMOCVDtechnology.1.Ga203filmswerefabricatedonsapphiresubstratesbylow-pressureMOCVDtechnology.ThecrystalandopticalqualityofGa203thinfilmswasinvestigatedbyX-raydiffractionandopticaltransm

5、ittancespectra.TheGa203filmisamorphousthatgrowndirectlyonthesapphiresubstrateandthetransmittanceandtheopticalbandgapwidthoftheGa203filmsareverysmall.Theexperimentshowsthat,thecrystalqualityandtheopticalpropertiesoftheGa203filmsarenotidealwhentheGa203filmswerefabr

6、icateddirectlyonsapphiresubstratesbyusinglow—pressureMOCVDtechnology.2.Inordertosolvetheaboveproblem,Ga203seedlayerwasfabricatedonthesapphiresubstratebyRFmagnetronsputtering,thenthe13-Ga203filmswerefabricatedonsapphiresubstrateswiththeseedlayerbylow-pressureMOCVD

7、technology.Theexperimentshowsthat,RelativetotheGa203filmsfabricateddirectlyonsapphiresubstrates,thecrystalqualityandtheopticalpropertiesoftheGa203filmsfabricatedonsapphiresubstrateswithGa203seedlayerhaveimproved,butnotevidently.3.TheGa203seedlayerwasannealedatahi

8、ghtemperature,thenthep-Ga203filmswerefabricatedonsapphiresubstrateswiththeannealedseedlayerbylow-pressureMOCVDtechnology.TheXRDshowsthat,theGa203filmshavetheob

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