Prospects for the development of optical systems for nanolighography.pdf

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1、Prospectsforthedevelopmentofopticalsystemsfornanolithographya
A.B.Bel’skiOAOS.A.ZverevKrasnogorskFactory,Krasnogorsk,MoscowOblastb
M.A.GanNPKS.I.VavilovStateOpticalInstitute,St.Petersburgc
I.A.MironovScientificResearchandTechnologicalInstituteofOpticalMaterialScience,S.I.Va

2、vilovStateOpticalInstituteAll-RussiaScienceCenter,St.Petersburgd
R.P.SesyanA.F.IoffePhysicotechnicalInstitute,RussianAcademyofSciences,St.Petersburg
SubmittedMay18,2009OpticheskiZhurnal76,5969
August2009Thispaperdiscussestheprinciplesunderwhichhigh-resolutionprojectionp

3、hotolithographicob-jectivesarecreatedandtherequirementsontheopticalmaterialsusedforthem.Itisshownthatfluoriteisoneofthemostpromisingmaterialsforcreatingobjectivesforphotolithographyatwavelengths248and193nm.Adiscussionisgivenoftheprospectsfordevelopinglens-basedprojectionobj

4、ectiveswithhighnumericalaperture,themodernstateoftheproductiontechnol-ogy,andalsomethodsforcertifyingthemainopticalparametersofphotolithographic-qualityfluorite.Fluoritecrystalsupto300mmindiameterand50mmthickhavebeenfabricatedandcertified.Thecrystalsgrownusingthistechnologyh

5、avehightransmittance
99.9299.96%at
=193nm,goodopticalhomogeneityn=
1410−6,andlowbirefringence
=0.52.0nm/cm.Thecrystalshavevirtuallynoluminescence.Proposalsaregivenforthedevelopmentofphotolithographicoptics.©2009OpticalSocietyofAmerica.INTRODUCTIONunusualperfectioni

6、ntheperiodconsideredhere.Itconsistsofseveraltensofopticalelementsmorethan300mminThefundamentalphysicalbasisforthedevelopmentofdiameterand,inanopticallengthofmorethanonemeter,microelectronicsformorethanhalfacenturyofitsdevelop-providesvirtuallyaberration-freeformationofanim

7、ageinamentwasandremainsawaveprocessofimagetransfer.fieldabout30mmdiameterwithanumericalaperture
NABeginninginthe1980s,thishasbeenprojectiontransferwithreductionofthescaleandwavelengthoftheradiationthatexceeds0.9.Itshouldbepointedoutthattheincreaseofbeingused.Thewavelength-

8、reductionprocessreachedthetheNAofprojectionobjectivesforlithographyhasbeenac-deepultravio