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1、ResearchontheNano-directWritingProcessTechnologyusingFountainPenNanolithographyResearchontheNano-directWritingProcessTechnologyusingFountainPenNanolithographyAbstractMicro/Nanotechnologyisamulti-disciplinarycrossinghigh-techfieldthatshowsgreatvitalityandislistedasoneofthe
2、importantfrontieroffuturetechnology.Scanningprobelithography,whichbasedonSPM,isakindofsimpleandflexiblemethodtoproducemicro/nanomaterialsandhasgotrapiddevelopmentinrecentyears.AsanewscanningprobetechnologybasedonAFM,Fountainpennanolithography(FPN)possessesoutstandingperfo
3、rmancessuchashighaccuracyandresolution,strongoperability,generalenvironmentrequests,continuedwritingandsoon.FPNhasbeenusedtoplaceavarietyofinksinspatiallypreciselocationsondifferentsubstrates,writedifferentpatternsandfabricatehighaccuratedevices.AndFPNhasabroadapplication
4、prospectinbiologyandmicroelectronics.DuetothelackofstudyingcontrolleddepositionofFPN,theworkingprogressofFPNshouldbestudiedfirstly.Theformationandworkingmechanismofcapillaryforce,whichprovidethetheoreticalbasisforthemechanismofFPN,areanalyzed.Accordingtothestrategyabove,t
5、hreestepsoftheFPNprogressincludingtheformationoftheliquidbridgebetweenthetipandsubstrate,thetransferofinkmoleculesintheliquidbridgeandthediffusioninthesubstrate,arestudied.Andthecontactforcebetweenthetipandsubstrateisanalyzedandmodeled.ThenexperimentsofFPNwritingwithsilve
6、rnanoparticleinkongoldsubstratearecarriedout.Theinfluencesofvariousparametersonthediametersofdotsandthesizesoflinesarediscussed,respectively.Thediametersofdotsaremainlyaffectedbythecontacttimewhilethesizesoflinesareaffectedbyvariousparametersincludingtheaperturesizeofthep
7、robe,writingmode,writingspeed,thesetpoint,theappliedvoltageandsoon.Onthebasis,theoptimalparametersofFPN,namelyasprobeapertureof200nm,writingIIIResearchontheNano-directWritingProcessTechnologyusingFountainPenNanolithographyspeedof2μm/sandsetpointof0.2V,arechosentowritecomp
8、lexpatternsincludingletters“S”“Z”“D”“X”andstaronthesubstrate.Finally,linesarewrittenonnon-conduc
