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1、HFCVD系统热丝参数遗传优化Jun.2003TransactionsofNanjingUniversityofAeronautics&AstronauticsVo1.2ONo.1GENETICoPTIMIZATIoNoFHoTFILAMENTPARAMETERSINHFCVDSYSTEMSONGSheng—li,ZUODun—wen,WANGMinXIANGBing—kun,LUWen—zhuang,LIXiang一g(1.CollegeofMechanicalandElectricalEngineering,29YudaoStreet,Nanii
2、ng210016,P.R.ChinaI2.EngineeringInstituteofEngineersCorps,PLAUST,Naniing,210007,P.R.China)Abstract:InHFCVDsystemthesubstratetemperatureisakeyfactorwhichdeeplyaffectsthequalityofdiamondfilms.Themagnitudeandthevariationofthesubstratetemperaturemustbelimitedinasuitablerangetodepositdi
3、amondfilmsofuniformthicknessoverlargeareas.Inthispaper,thehot—filamentparametersareinvestigatedonthebasisofGAstorealizeagoodsubstratetemperatureprofile.ComputersimulationsdemonstratethatonparametersoptimizedbyGAsauniformsubstratetemperaturefieldcanbeformedoverarelativelylargecircle
4、areawithR.=10cm.Keywords:hot-filamentchemicalvapordeposition;temperaturefieldIgeneticalgorithmsIoptimizationIdiamondfilmCLCnumber:0781lTQ164.8Documentcode:AArticleID:1005—1120(2003)01—0042.O5INTRoDUCTIoNDiamondfilmpossessesremarkablephysicalandchemicalproperties,includingextremehar
5、dness,highwearresistance,lowcoefficientoffriction,chemicalinertness.infraredtransparencyandsemi-conductingproperties,whichmakeitattractiveforvarietyofapplicationinareasfromthermalmanagementinmicroelectronicdevicestocoatingmaterialsfordrillingtools[¨.Acommonmethodforpreparingdiamond
6、filmischemicalvapordeposition(CVD),suchashotfilamentCVD(HFCVD),microwaveCvD,flameCvD,DCplasmaassistedCVDandsoon.AmongallthediamondCVDprocesses.theHFCVDprocessisthemostpotentialmethodbecauseofitsadvantagesofsimpledevice,lowcostandeasycontro1.Itisknownthatoneofthekeyfactors,whichrest
7、rictsthehigh-rateandgood-qualitygrowthoflargeareaofdiamondfilmisthesubstratetemperature.Themagnitudeandtheuniformityofthesubstratetemperatureiscloselyrelatedtothequalityandgrowthrateofdiamondfilm['-*].WoldenetalES3predicted'thesubstratetemperatureasafunctionoffilamentshapeandgeomet
8、rybyusingheattransfercalcu
