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ID:52431943
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页数:23页
时间:2020-04-06
《微波cvd制备硅薄膜类石薄膜白辉勇,熊军.ppt》由会员上传分享,免费在线阅读,更多相关内容在行业资料-天天文库。
1、微波CVD制备硅薄膜&类金刚石薄膜1微波法制备大面积硅薄膜设备及工艺(大面积)表面波微波等离子体线形微波等离子体2CapacitvelyCoupledPlasma13.56–60MHzRelativelylowdensityNon-uniformitycausedbyStandingWaveEffectSkinEffectEdgeEffectElectromagneticpropertiesQuasi-staticpropertyElectrostaticpropertyPECVD&MWCVD(表面波微波等离子体)(1010–1011cm-3)SurfaceWavePl
2、asmaRelativelyhighdensity(1011~1012cm-3)Microwave(915MHz,2.45GHz)EasycontrolofuniformityQuartzPlateSurfaceWavePlasma3012341990199520002005GlassPlateArea(m2)WorkingYear20107thGen.6thGen.5thGen.4thGen.3rdGen.2ndGen.1stGeneration300x400370x470550x670730x9201,100x1,2501,500x1,8501,8700x2,250
3、TrendofLCDPanelGreatneedforlarge-areaplasmasourcesforgiantmaterialsprocessing.Example:-thinfilmdepositionforLCD(LiquidCrystalDisplay)-Thinfilmsolarcell-surfacecoatingofhousingglassplateforUVandIRlightcut,-surfacemodificationofplasticmaterialsandpaperGiantMaterialsProcessing4PlasmaQuartzp
4、lateWaveguideT-shapequartzUseofT-shapequartzHugemechanicalforceonquartzplateAreaof1m2Pressureof8tons7cmthickquartzplateDifficultiesinMicrowaveExcitationMicrowaveCVD---GiantHigh-densityPlasma5Waveguide2.45GHz1mQuartzPlatePlasmaQuartzPlateHugeAtomosphericPressure8tons/m27cml0=12cm6SiDeposi
5、tiononLargeSubstrateGlassSubstratePolymerFilmSubstrate1.8m0.2m1.8m0.3mExperimentalConditionsMicrowavePower~6kWPressure7PaH2/SiH4=25/25sccmSubstrateTemperature250oCExperimentalConditionsMicrowavePower~4kWPressure12PaH2/SiH4=25/50sccmSubstrateTemperature180oCMicro-crystallineSifilmsAmorpho
6、usSifilms7Power:2kW,Totalflowrate:522sccm(10%SiH4+90%H2),Substrate:250oCDepositionratemc-SiFilmDepositionVeryhighdepositionratewasachievedduetohighdensityplasma.8CrystallinevolumefractionRamanspectra40045050055060000.10.2RamanIntensity(arb.units)RamanShift(cm-1)SiH4Totalpressure:4Pa16Pa6
7、4Pa2H10%90%00.20.40.60.8101020304050607080XcTotalPressure(Pa)Highcrystallinevolumefractionof70%wasobtainedathighdepositionrate(~10nm/s:goal).mc-SiFilmDeposition9表面波微波法制备微晶硅薄膜工艺条件P型微晶硅性能要求本征I层微晶硅性能要求N型微晶硅性能要求衬底玻璃玻璃玻璃沉积速度(nm/s)~10~10~10薄膜厚度(nm)~30~3000~30均匀性(%)>90>90>90沉积温度
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