资源描述:
《半导体器件模拟》由会员上传分享,免费在线阅读,更多相关内容在教育资源-天天文库。
CONTENTSPART1:NMOS1GettingStarted12CreatinganNMOSDeviceStructureUsingATHENA33NMOSDeviceSimulationUsingATLAS254CreatingNMOSStructureUsingDEVEDIT35PART2:OTHERDEVICES5ThinFilmResistor:CreatinganThinFilmResistorUsingATHENA456ZenerDiode567MSJunction:CreatingaM-SJunctiongUsingATLAS598MESFET659BJT8910SolarCell10611TFT119Appendix129
1Chapter1: 1.1ᙠDeckBuildATHENAᐭ☢,ᙠ☢Ḅᙢ᪗!"#$%ᐭ"deckbuild-an&"&'()*+,-./,DECKBUILD012345.ᙠ01789ᑮ“ATHENA”;᪵.=⊤?4ᙠ@ᐭATHENAAᙽ.—|DeckbuildV3.20.0.R-(NONE),dirC/space/silvaco_softwares/pc/workshop|Filer)ViewvjEditrjFind)MainControl)CommandsToolsnext)line:stopv)contJrun)quit)Line:1paste)initJpause)clear!restart)kill)Stop:NoneATHENAVersionathena5.8.4.R(TueNov918:00:27PST2004)Copyright(c)1989-2004SILVACOInternationalAllrightsreservedWeacknowledgethecontributionofthefol1owingcollaborativepartners:ATHENAstartedATHENAD1.1DECKBUILD01E5F៉DECKBILDTATHENAḄHᑴJᡃLMNOPQATHENA᪗RS.
21.2OTATHENA᪗RSᙠAHENA01:VWMainControl⌱Examples...— YWᡠ[ᐶ]Ḅ^_P^_ loadexample- run
3Chapter2:ᵨATHENAa"bNMOSᘤde᪀2.1*ghiᙠjkl,ᵨᡝ8noᑮa"bᐺqMOSFETe᪀Ḅrj.=QᒹtOa"buḄAvwx◊yz{|}conformaldepositionO+~⇨◊ᓄJᦣJ⌨Nᐭ◊e᪀OyOe᪀ᡠᨵ=QJᓫᙠATHENAAvᘤl.2.2a"be᪀2.2.1zwxa.ᳮᦻj01:VWFile—⌱EmptyDocument.b.ATHENAEAvᘤ——ᙠᦻj01%ᐭgoathenaᩭJᡃL8Ḅzwx.◤⌕£Ḅ¤,¥¦ḄwxᙠAvl§ᐵ©⌕.xVᦪ«¬ᑮᘤdḄ®¯P./.b®°Ḅwx±²34ᙠᐵ³´JᐭḄᙢ,pnezᡂḄ³´JᡈὅᐝAvlḄᐝ¹ºᑖ.c.ᡭ wx01:VWCommands—⌱MeshDefine...2.2.2a"b0.6um*0.8umAv³´b½ᙳᒴwxᙠᡭ ḄMeshDefineÀ☢Ja.Direction:XÁÂ⚗Ä.b.ᓫWComment%ᐭ“Non-UnifbrmGrid0.6um*0.8um”.c.ᓫ.WLocation,%ᐭ0;ᓫWSpacing,%ᐭ0.1.d.ᓫWInsert.e.ÅᵨÆ᪵ḄÇÈÉx=0.2.spac=0.01;x=0.6.spac=0.01.f.a"YᔣËḄwx:ᙠDirectionÌᓫWY,ÈÉy=0.00.spac=0.008;y=0.2.spac=0.01;y=0.5.spac=0.05;y=0.8Fbj'spac=0.15.ᡃL8£ᑮwxᨬÎḄᙢ¤ᙠ⊤☢}ÏOum y=0.2umḄᙢÄ.ÐEᙠ☢=b³´8zᡂNMOSḄ⊤☢ᨵѳ.g,⚜Ózwx:ᓫWView.…}£hᐳÏÕ51786bxVP3404bÖ×z.Ä
4!-nxh.ᑏᐭᦻj01:ᓫWWRITE.2.3ÙÚa.ᡭ ATHENAMeshInitializeÛᓫ:VWCommands—>MeshInitialize.b.ᙠÜ3Ḅ013⌱ÝMaterial:SiliconOrientation:100Impurity:BoronConcentration:ByConcentration,1.0,14Dimensionality:2DComment:InitialSiliconStructurewith<100>Orientation(M⌱⚗."ß!àáᵨ,)=᪵ᩭJbãä0.6umX0.8mஹᙳᒴæᩖè1XlOMatom/cn?ஹ(100)ᔣḄấÙÚ2a"3ᩭ5.(Si(100)ÙÚ:ᐹᨵëÀ☢ᵯ₹ஹëÀ☢î◍ḄðV.CMOSñᡂᵯòóÅᵨ(100)ᨔᔣḄấᩞᧇ)c.ᓫWWRITEd.ᓫWRUNDECKBUILD÷øÏÕù.e᪀ᦻdstructoutfile=.history01.str.ÅúNÇûMü9ᐸᐹþe᪀:᪗ÿ historyLstr”>Tools—>⌱PlotPlotStructure,ᑮ᪀.regional!material"#.%&'(ᡈᐸ"#plot—>Display,⌱+,᪗(Mesh)ᯠ/Applyᓽᑮᐸ'(ᑖ2.Tonyplot:Display(2DMesh)34ᐸ5᪗ᑖ6⊤:EdgesஹRegions(orMaterial)Contour>LightஹVectorssJunctions>Electrodes>ThreedஹDraw(?).
52.4'ᡂ᪕*+;ᩭᡃ>?⌕ᙠấ⊤☢Dᙠ950࠷ஹ3%HCLஹ1,ᜧFGᩩIJᵨLMNᢝP11ᑖQᡂST᪕MT.ᐜ/⌱uCommands>Process—>DifTuse,"ᡭXATHENADiffuseYᓫ.ᙠ[\ஹ]^ஹ_aᑖ6bᐭᡈ⌱11ஹ950ஹDry02.de:bᐭᦪg/ᙳ◤ᢥkl.m⌱GasPressureatm!HCL%,bᐭ⚜ᐜopqḄs1!3.Commentabᐭ“gateOxidation”.ᯠ/ᑏᐭDECKBUILD.ᓫContᢥuvPwx.y/?zᡂstrᦻI.;Ḽ}~strᦻI.history02.str------ " history02.str”⌱PlotPlotStructureᓽᑮᨬwx᪀.2.5,-᪕*+./ᩭ?ᙠMᓄ᪕MTḄ^.?ᵨᑮDECKBUILDExtract.Extract᧕ᙢᔠ!ᑴsᡈ.¡pᑴḄ⊤¢£ᡈ⌱¤¥!ᘤIwxᘤ§Ḅ᪗¨©.ªᓽ⌱᪗¨Ḅ⊤¢£«ᦋy®¡Ḅ◤⌕.¯°⌱"Commands—>Extract”±ᐭATHENAExtractYᓫ.⌱ᡈbᐭ²Extract:MaterialthicknessName:GateoxideMaterial:Si0-2Extractlocation:XValue:0.3ᓫWRITEContᢥuvPwx?ᑮḄ᪕MT^.^³ᙠ131´.ᙠµᡃ>?ᵨDECKBUILDḄOptimizer¶᪕MTḄ^±·¸ᓄ.2.60ᓄ᪕*+./ᙠ¹⁚ᡃ>?»¼½᪵ᵨOptimizer¶᪕MT¤¥¿ᦪ±·¸ᓄ.Ꮇo᪕MTÁ᪗^Â100´.ÂâᑮÄÁḄ,ᦣ]^!FGᙳ◤È⁚.ᐜ/ᓫ“MainControl—>Optimizer”ᓽ±ᐭDECKBUILDOptimizerÉ☢.ᙠModeÂSetup⌱ᨬᜧÊËÂ1%------uMaximumerror%=1"ÌStopcriteriaaÍm.ᦋModeÂParameters.ᙠ¹Î,᪕M^¸ᓄ¿ᦪ⌱]^!GÏ.ÂÄᡃ>ÐkᑮDECKBUILD adiffusetime=lltemp=950dryo2press=1.00hcl.pc=3”Ì2.1.ᯠ/ÑkᑮOptimizer,¯°⌱"Edit—>Add"⌱temp!press⚗ᓫApply.ᦋModeÂTargets.Optimizer?ᵨDECKBUILDExtractpÓ¸ᓄÁ᪗.ÔÄÑ°kᑮDECKBUILDᦻ¹34 extractÌ2.2.ᙠÑkᑮOptimizer[⌱“Edit>Add"ᙠTargetvalueabᐭÁ᪗s“100”.ÂÃÕÖ,¸ᓄᙠModea⌱GraphicsᓫOptimize.,¸ᓄ?×ØÈ]^!GÏᨬÙ¢ᑮÁ᪗s.ᨬÙOptimizer?ᦈÛÜ]^ஹGÏᑖ6³Â926࠷ஹ0.98[Ḅ᪕M^Â100.209´.;Ḽᡃ>?Þ,sßᑴᑮDECKBUILDÐᑮÁ᪗s——ᦋModeÂParameters,⌱
6Edit—>CopytoDeck^ᓽ.2.1 diffuse2.2 extract2.7áâdᐭáâdᐭãäåæçᩖḄé⌕êN.ÔÂáâdᐭᙠëḄᐵíî(criticaldimension,CD)!ïçᑖ2,ᑺñòdᐭ(tiltedimplant)!ᐸ5ᐜ±ᢈôᨵḼö÷øᵨÔĶÎâdᐭḄwxÐù⌕Ã.ᙠ¹Îᡃ>?Jᵨúdᐭû9.5X10”cm 2ஹüñlOKeVஹáâýòþ^Â7ஹÿ 30°Ḅ█ᵯᐭ.ᐹa.⌱“Commands—>ProcessXmplant…”ᡭ.ATHENAImplantᓫ.b.⌱ᡈᐭimpurity:BoronDose:9.5X1011Energy:10Model:DaulPearsonTilt:7
7Rotation:30MaterialType:CrystallineCommnt:ThresholdVoltageAdjustimplantc.ᓫWRITECont2.8ᵨTONYPLOTᑖ᪆#ᩖ%ᑖ&a.ᵨTONYPLOT'(strᦻ*“.history05.str”.+Ḽ⌱“Plot—>Display...b.ᓫContours-᪗(012).c.45⌱**Define—>Contours…"8Quantity⌱Boron.d.ᓫApply.#ᩖ%Ḅᑖ&--ᡠ:TonyPlotUZ&28.R__________FilerjViewjr)Plotv)ToolsvjPrintJronerties8jHelpv)AIHtNADatafrom.historyOb.strftmn(K:in3)161..9G1..451..S15.5.411.S41.4.51.531.31乙2©SILVACOInternational2005-2.3;<ᐭ=#ᩖ%>?ᑖ&-+ᩭ8ᡃBᵨCDE᪀-GcutlineHᐹIJ2#ᩖ%ᑖ&ḄDKL-.a.⌱"Tools—>Cutline,ᡭCutlineᓫ.b.⌱02-᪗MNO⌱⚗Q.c.R᪗STUVᓄXGYZ[\]E᪀Ḅ^_.#ᩖ%Dᑖ&-`-ᡠ:.
8TonyPlotV28.26RFileT)Viewa)Plot)Tools8bPrintrPropertiesc)HelpvATHENASeclton1fromliisUjryt)5.strDatafromJitstoryOS.str(0297.-0JJ193)to(0.297.0.Z93)14-0.1112t,314OSOA9.7MicrosDragmousetodefinestartandendofcutline©SILVACOInternational2005-2.4ᙠE᪀G(ᚖfKLg2.9ᐳijk(conformaldeposition)lᨔấᐳijkoᵨᩭpqlXE᪀.ᐳijkrᨬtᓫḄjkuv8oᵨwxjkXiyZzᱯ|⌕~Ḅi.NMOSHlᨔấ?2000.a.✌ᐜᡭATHENADepositᓫ----45⌱uProcess—>Deposit—>Deposit...”ᓽo.b.⌱ᡈᐭType:confbrmal(NO⌱⚗)Material:PolysiliconThickness:0.2Totalnumberofgridlayers:10Comment:ComformalPolysiliconDepositionc.ᓫWRITEContd.'(E᪀.E᪀.
9-2.5lᨔấḄᐳij2.10tᓫ⇨+ᩭrlᨔấ᪕Ḅ.ᙠlᨔấ᪕ᙠx=0.35umᜐ,ᙠx=0.6umᜐ.8ᡃB⇨x=0.35umSḄ.a.45⌱“Commands—>Process—>Etch—>Etch...”ᡭATHENAEtchᓫ.b.⌱ᡈᐭEtchMethod:Geometrical(NO⌱⚗)Geometricaltype:LeftMaterial:PolysiliconEtchlocation(um):0.35Comment:PolysiliconDefinitionc.ᓫWRITECont.¡ᑮḄE᪀-.
10-2.6⇨lᨔấiᡂ᪕2.11lᨔấVᓄ¤rlᨔấVᓄlᨔấ;<ᐭ¥ᩖ¦§ᜓ.Vᓄᩩ*ᙠ900CJ2ᜧ«ᵨ¬V®¯3ᑖ°.Vᓄrᙠ±²³Ḅ-ᫀᓄḄ(µ¶☢Ḅ)lᨔấG®¯8ᡠpᵨḄYfermi¸compressY.fermiYrᵨᙠ¥ᩖ>?¹wIXḄ±²³Ḅº^»compressYᵨwu¼µ¶☢E᪀VᓄCDVᓄ.a.✌ᐜᡭATHENADiffuseᓫ:45⌱"Commands—>Process—>Diffuse...”ᓽo.b.⌱¸ᐭTime:3Temperature:900Ambient:Wet02Gaspressure:1HCL(uncheck)DiffusionModels:FermiOxidationModels:CompressibleComment:PolysiliconOxidation
11c.ᓫWRITECont¡ᑮḄE᪀-.-2.7lᨔấ᪕ḄVᓄ2.12lᨔấ¥ᩖlᨔấVᓄ=8•¤`rᵨ¿¥ᩖlᨔấiᡂn+lᨔấ᪕.ᙠÀÁ8¿ᑺÃ3X1013cmÄᐭÅÃ20KeV.a.✌ᐜᡭATHENAImplantᓫ:45⌱"Commands—>Process—>Implant..."ᓽo.b.⌱¸ᐭImpurity:PhosphorusDose:3X1013Energy:20Tilt:7Rotation:30Model:DualPearsonMaterialType:CrystallineComment:PolysiliconDopingc.ᓫWRITEContd.'(E᪀,ZÆÇᐸÉ¥ᩖᑖ&----aDisplay(2DMesh)>Contoursicon(012)
12—>Apply”.-2.8lᨔấ;<ᐭ=É¥ᩖᑖ&e.ÆÇ¿ᑖ&---ᐜᡭContoursÊË“Display(2DMesh)—>Contoursicon—>Apply>Define(ÌT)->Contours...”,ᯠ=⌱QuantityPhosphorus,ᨬ=ᓫApplyDismiss.¿ᩖ%>?ᑖ&-ᡠ:.
13ËTonyPldTV2.8.2&RFileτViewPlot1Tools8Print\)PropertiesHelpbATHENADatafrom.histoi\O9.strSUCUD一二F揩僚e驾产i为2©SILVACOInternational2005-2.9¿ᩖ%>?ᑖ&2.13◞;VᓄXḄÏk(SpacerOxideDeposition)ÐஹÒ;<ᐭÓÔÕÖ®¯◞VÏk.◞VÏk?0.12um.a.✌ᐜᡭATHENADepositᓫ45⌱“Commands—>Process—>Deposit>Deposit…”ᓽo.b.⌱¸ᐭMaterial:OxideThickness:0.12Totalnumberofgridlayer:10Comment:SpacerOxideDepositc.ᓫWRITECont
14-2.10◞VÏk=ḄE᪀2.14Øᜋ(SidewallSpacer)Vᓄ◞;Ḅiᡂa.ᡭATHENAEtchᓫb.⌱ᡈᐭMaterial:OxideThickness:0.12Commnt:SpacerOxideEtchc.ᓫWRITECont
15-2.11Úiᡂᜋ◞V2.15Ð/ÒᐭÜ⌨ÞßiᡂNMOSḄn+Ð/Ò8ᙠ,àᵨḄráâᑺÃ5X10&m&,ᐭÅÃ50KeV:a.ᡭATHENAImplantᓫb.⌱ᡈᐭImplant:ArsenicDose:5XIO15Energy:50Tilt:7Rotation:30MaterialType:CrystallineComment:Source/DrainImplantc.ᓫWRITE+ᩭᙠ900࠷ஹ12ᜧ«ஹã«äå⌨Þ1ᑖ°a.ᡭATHENADiffuseᓫb.⌱ᡈᐭE
16Time:1Temperature:900Ambient:NitrogenGasPressure:1DiffusionModels:FermiOxidationModcls(uncheck)Comment:Source/DrainAnnealingc.ᓫWRITEContᵨTONYPLOT'(æE᪀Ḅ¥ᩖᑖ&-.-2.12Ð/Ò;<ᐭÜ⌨Þ=É¥ᩖᑖ&¤8ᡃBçÆÇ⌨=Ô=É¥ᩖᑖ&.ßèᑮéḄ8a.ᙠG-ÊË,45⌱“File—>LoadStructure...”,ᙠfilename⚗Tᐭ".history12.str",ê=ÌTULoadZ⌱Overlay.À᪵ᩭ8".historyI2.str”⌚íwu.history12.strMÓG.b.45ᓫ“Tools—>Cutline...''ᡭCutlineÊË.c.⌱Tî-᪗8ᐭXஹïStartX:0.1Y:-0.05EndX:0.1Y:0.2d.+ðñT,ᙠòóḄôõöO᪾ᓫConfirmᢥùᓽoúᑮ⌨ÞÔ=D>?ᑖ&--.
17TonyPlotU282&RFileτViewPlot'jTools,)Printv)PropertiesHelp8τATHENAOVERLAYSoction1from.history13.strDatafrommultiplefiles(0.1,0.05)to(0.1,02)Het_=2019181e217n2=云1$w==.6-,tJ,7S=_:12凝I(kl00€008110120.140.1S018120.220.24Microns&SILUACDInternational2005-2.13⌨ÞÔ=É¥ᩖ>?ᑖ&2.16ûüḄÏkAthenaḄᵯorûüஹấᓄᱥᡈlᨔấ.þḄᱯrÿᵯᙠ᪀Ḅ◤ὃ⇋ᔲᙠ.ᙠ,NMOSḄᓄᐜᡂ!/#Ḅ$%&'(ᯠ*+,A1-A1.ᫀᓄ.01ᡂ!/#Ḅ$%&'2=0.2111114Ḅ5ᓄ6789⇨ᣵ.a.ᡭ=ATHENAEtch>ᓫb.⌱AᡈCᐭEFGeometricaltype:LeftMaterial:OxideEtchlocation:0.2Comment:OpenContactWindowc.ᓫGWRITEIContHiTONYPLOTJKᐸ᪀...
18.2.14ᓄNᡂ$%&'$EᩭᵨATHENADeposit+,0.03umQḄALa.✌ᐜᡭ=ATHENADeposit>ᓫ.b.⌱AᡈCᐭEFMaterial:AluminumThickness:0.03Totalnumberofgridlayer:2Comment:AluminumDepositionc.ᓫGWRITEICont
19.2.15HalfNMOS᪀ḄS+,ᨬ*ᵨEtch9⇨x=0.18umUḄS6Fa.ᡭ=ATHENAEtch>ᓫ.b.⌱AᡈCᐭEFGeometricaltype:RightMaterial:AluminumEtchlocation:0.18Comment:EtchAluminumc.ᓫGWRITEICont
20.2.16HalfNMOS᪀ḄS9⇨2.17VWᘤYZᦪᙠ⁚(ᡃ^7VWHalfNMOS᪀Ḅ_`ᘤYZᦪ•b`Zᦪᒹd:fஹn++!/#hᙽᵯjஹ◞5ELDDhᙽᵯjஹlm⍝█pᵯq.ᡠᨵb`Zᦪ,ᙳᵨDECKBUILDḄExtractVW.2.17.1VWfa.ᡭ=ATHENAExtract>ᓫ---vw⌱A“Commnds—^Extract”ᓽ.b.⌱AᡈCᐭEFExtract:JunctiondepthName:nxjMaterial:SiliconExtractlocation:X=0.2c.ᓫGWRITE.ᦻY&'7z{Fextractname=Mnxjnxjmaterial=nSilicon"mat.occno=lx.val=0.2junc.occno=lᙠ|extract}~,name“nxj”n!/#f;xj⊤f7⌕8VW;material="Silicon”ᢣᒹḄᱥ0ấ;mat.occno=l⊤VWfḄ0_6ấ
21ᜐ;x.val=0.2ᢣVW!/#fx=0.2umᜐ;junc.occno=l⊤VWfᙠ_ᜐ.ᙠᩖḄ᪀(Ḅᱥ6ᨵ1.(•n+!/#p▟-nḄ᪀(ᨵ.2.17.2VWN++!/#hᙽᵯj01VWhᙽᵯj(ᐜwATHENAExtract>ᓫ(ᯠ*⌱AᡈCᐭEFExtract:SheetresistanceName:n++sheetresistanceExtractlocation:X=0.05$ḼᓫGWRITE.ᦻ&'7z{EᦻFextractname="n++sheetres”sheet.resmaterial="SiHcon”mat.occno=lx.val=0.05region.occno=lᙠ|}~,sheet.res0ᓽ7VWḄhᙽᵯj;mat.occno=l-region.occno=l¡ᱥ-¢£¤6ᦪᙳ0l;x.val=0.05⊤VWḄ0x=0.05umᜐ.VWḄ¥ᦪ¦§ᙠresults.final.2.17.3VWLDDhᙽᵯj01VW◞5EḄLDDhᙽᵯj(ᵫN☢ª«¬ᑮḄ᪀,X=0.3ᔠᳮḄ.VW°±²,◤ᦋ´ḄµExtract-Nameᦋ0IddsheetresIExtractlocationḄX¶ᦋ00.3.2.17.4VWlm⍝█pᵯq01VWx=0.5umᜐNMOSḄlm⍝█pᵯqFa.ᡭ=ATHENAExtract>ᓫ.b.⌱AᡈCᐭEFExtract:QUICKMOSIDVtDevicetype:NMOSName:IdvtQss:lelOExtractlocation:X=0.5c.ᓫGWRITE·Cont.ᙠb◤⌕ᱯ¹ᢣzḄ,Qss0◍▟ᵯ₹¼ᓫ0cm”.½¾¿ÀE(0V,᪕q00-5V,Âl0.25V,ᘤYÃÄ0300Kelvin.
222.18ÅƬᑮÇNMOS᪀N☢¬ᑮḄµHalfNMOS᪀(01¬ᑮÇ᪀($Eᩭ◤É|᪀ÊËMirror.|ÂÌÍÎᙠCHI᪀ᡈÏÐᵯÑNÇᡂ.ᐹÓ°±EFa.vw⌱“Commands—>Structure—>Mirror”ᡭ=ATHENAMirror>ᓫ.b.ᙠÔzḄ&'⌱Right.c.ᓫGWRITEICont.Ç᪀E.R)nyPl01U2.B.28.RnFIeViewPlotTtx»ls-Printஹ)Properties\ஹHelpATIIENADatafromnmos.str©SILVACOInternational2005.2.18ÇNMOS᪀¼¡ᵯNÖ×b.Øz(UÙᑖ᪀Çᐰ4ÙᑖḄᑴ(ᐹÓḄ¶ᒹdÝÞ(ßᩖp,àà.2.19¡ᵯ01áᙠᘤYª«ᘤATLASâãq,NMOSᨔÓåḄᵯÍÎÊË¡Fa.vw⌱“Commands—>Structure—>Electrode...”ᡭ=ATHENAElectrode>ᓫ.b.⌱AᡈCᐭEFElectrodeType:SpecifiedPositonName:Source
23XPosition:0.1c.ᓫGWRITE.æçᙢ(¡#x=l.lஹ᪕x=0.6ᜐ.ᨬ*¡éᵯ.ᙠATHENA(éᵯ᪀Ḅ◤⌕ᔲᨵᙠ.01¡éᵯ(ᙠᡭ=ḄElectrode(⌱ElectrodeType0Backside,ᯠ*ᙠName_êëᐭbacksideᓽ.2.20§ATHENA᪀ᦻYìᯠDECKBUILDḄᔊîïðhistoryfunction(§ñòóÂÌḄ᪀ᦻY(ôᙠõ¿ÀE(ᡃ^◤⌕Ḅö÷§-øùᓄ᪀.ᳮᵫEFi.ᔊîᦻYḄᦪᨵ▲ᑴ¼½¾25Öii.ûÍ⌕ᙠñwDECKBUILDᦻüË*§ýᓝᔊîᦻY¼ñᔊîᦻYᓰ ᓝᡈ K⁚iii.ᵨᡝḄᐵḄᦻᨬᑮḄ᪀ᦻᡈ!ᡃ#$᪀%a.&'⌱“Commands—>FileI/O...”ᡭ+ATHENAFileI/O,ᓫ.b.ᓫ/Saveᢥ1234ᦻnmos.strc.ᓫ/WRITE5Cont.d.ᵨTONYPLOTᡭ+nmos.str᪀ᦻ.⌱6ᵯᢥ19:;<ஹ>ஹ᪕5@ᵯ
24A2.19BNMOS᪀
25Chapter3:ᵨATLASDNMOSEFᘤHI3.1ATLASJKATLAS#$LMᱥᳮḄPQᘤHIᘤ.RS⚜UᱯWXYZ᪀Ḅᵯ[F%2\ᘤ]F^ᑁ`ᱥᳮaᑴ.ᙠSILVACO'sVIRTUALWAFERFABHIdf,ATLASSᓫhiᵨᡈὅk#$᪶mnᐹ.ᙠ⚜UᵯpឋrᔜtuvwxyḄᐜ{|},ᘤHI~IᔠᘤHI5SPICEH.3.1.1ATLASᐭ5A3.1ḄᐭATLASḄ.ᜧ`ᑖATLASHIiᵨ$ᐭ:#$ᒹFḄ3ᦻᦻ%9#$W᪀Ḅ᪀ᦻ.ATLASᦻ.]F(run-timeoutput)]FtuḄᢣᓭ%2£¤┯¦5§£¨Ḅ©ª;¬ᦻ(logfiles)ᘤᑖ᪆^ᡠᨵ±²Ḅᵯ³ᵯ´;\ᦻ(solutionfiles)ᘤᜐM¶#·´f\vw¸ᐵḄPQஹQᦪº.A3.1ATLASḄᐭ»3.1.2ATLASḄ3{|ᙠATLAS}%¼$ᐭᦻ½¾ᒹ¿9ÀÁ{|ᑡḄÄÅÆÇ(ᑡ{|A3.2).{|┯¦%È#$┯¦%u|]FÉÊ%ᡈ~YËu|ḄÌÀÁ]F.
26GroupStatementsMESHREGION1.StructureSpecificationELECTRODEDOPINGMATERIALMODELSCONTACTINTERFACE3.NumericalMethodSelection-METHODLOGSOLVE4.LOADSAVE5.ResultsAnalysis_____EXTRACTTONYPLOTA3.2ATLAS3Å9¼ÅÍ⌕ḄÆÇ3.1.3789:ATLASᙠDECKBUILDf]FATLAS,ᐭdeckbuild-as&